1952
First high vacuum deposition machine

1980
Change of automation from electromechanical to microprocessor system

1980
Change of automation from electromechanical to microprocessor system

1990
First PECVD plant

1998
Third generation Sputtering plant

1998
Third generation Sputtering plant

2000
PC for integrated process control

2005
Fully digitalized and online machine

2005
Fully digitalized and online machine

2022
Innovation continues…